Ming Chi University of Technology

Nano Surface Analysis Lab.

Jyh-Wei Lee
https://mse.mcut.edu.tw/p/405-1043-13476,c1401.php?Lang=en

Research Field

Materials Engineering

Introduction

Dr. Jyh-Wei Lee is a Chair Professor at the Department of Materials Engineering at the Ming Chi University of Technology (MCUT), Taiwan, and a Joint Appointment Distinguish Professor at the College of Engineering, Chang Gung University, Taiwan. He has been the Director of the Center for Plasma and Thin Film Technologies (CPTFT) since 2021 and the Director of the International Ph.D. Program in Plasma and Thin Film Technology, MCUT, since 2023. Prof. Lee is the Chair of the AVS-Taiwan Chapter and a member of the Editorial Board of Surface & Coatings Technology, Applied Surface Science Advances, and China Surface Engineering. He is the AVS ASED Program Committee member, the Program Chair of ICMCTF2023, and the General Chair of ICMCTF2024. He is also an International Program Committee Member, Symposium Chair, and Session Chair of several famous international thin film and plasma-related conferences, such as PSE, AEPSE, TACT, and ICMCTF. His research focuses on developing plasma-based thin film technologies to enhance the properties and performance of functional thin films and coatings. He investigates the nanocomposite and nanolaminated nitride, carbonitride, and boronitride hard coatings for tribological applications, corrosion, and oxidation protection in related industries. Recently, he has worked on the research and development of high entropy alloy thin films and thin film metallic glass materials, which can be applied in the corrosion resistance, high-temperature, and biomedical fields. 

Prof. Lee is the PI and Co-PI of more than 30 projects from the Taiwan government and industries, with a total budget of around 7.0 million US$ in the past four years. He holds 13 patents and publishes over 200 SCI journal papers and over 30 plenary/keynote/invited lectures in PVD and related surface engineering technologies. The H-index of his published paper is 42. He is listed in the World's Top 2% Scientists published by Stanford University from 2020 to 2022.

Nano Surface Analysis Laboratory is working on developing plasma-based thin film technologies to enhance the properties and performance of functional thin films and coatings used for cutting tools, molding dies, surgical instruments, and optical, antibacterial, and pollution treatments.  We also investigate the nanocomposite and nanolaminated nitride, carbonitride and boronitride hard coatings for tribological applications, corrosion, and oxidation protection in related industries. We work on the research and development of high entropy alloy thin films and thin film metallic glass materials, which can be applied in the corrosion resistance, high-temperature, and biomedical fields. We are also devoted to the following deposition techniques, including high power impulse magnetron sputtering (HIPIMS), pulsed DC magnetron sputtering, cathodic arc evaporation deposition and plasma electrolytic oxidation techniques, plasma diagnosis, and feedback control, nanoindentation, AFM and related nanomechanical testing methods. Recently, we started researching low-temperature plasma, which can be applied in medicine and health care. 


Research Topics

1. Thin film metallic glass

2. High entropy alloy (HEA) thin films, including HEA nitride, carbide, and oxide thin films.

3. High power impulse magnetron sputtering (HiPIMS)

4. Transition metal nitride hard coatings

5. Plasma electrolytic oxidation

6. Cathodic arc evaporation

7. Corrosion and corrosion prevention techniques

8. Nanoindentation and mechanical properties evaluation techniques


Honor
  • The World's Top 2% Scientists (2020 ~ 2022) published by Stanford University
  • Research Award, MCUT, Taiwan (7 times since 2012)
  • 17th National Innovation Award in Academic Research Category, Taiwan (2020)
  • Excellent Paper Awards, TACT2020, TACT2021
  • R & D Creativity Silver Award, The 18th Formosa Plastics Enterprise Application Technology Conference, Taiwan (2023)
  • The Best Paper Award, The 18th Formosa Plastics Enterprise Application Technology Conference, Taiwan (2023)

 


Educational Background

Bachelor Degree: Department of Materials Science and Engineering, National Tsing Hua University, Taiwan

Master Degree: Department of Materials Science and Engineering, National Tsing Hua University, Taiwan

Ph.D. Degree: Department of Materials Science and Engineering, National Tsing Hua University, Taiwan


2 Vacancies

Job Description

  1. Thin film deposition by HiPIMS or related PVD techniques 
  2. Chemical composition, phase and microstructure analysis of thin films
  3. Mechanical properties evaluation of thin films 
  4. Corrosion resistance of thin films 
  5. Biocompatibility evaluation of thin films

Preferred Intern Education Level

Bachelor degree or higher

Skill sets or Qualities

  1. Thin film deposition techniques 
  2. Microstructure analysis technique 
  3. Mechanical properties analysis technique